New ALD Valve

New ALD7 UHP Diaphragm Valve for Atomic Layer Process

Available August 1, 2022

To help meet the semiconductor industry's need for enhanced consistency in fluid system performance, Swagelok is introducing the new ALD7 UHP valve for atomic layer processes. The ALD7 is the latest addition to the Swagelok family of ALD products and was designed for semiconductor OEMs and chip manufacturers. Featuring higher flow capacity (0.7 Cv), improved actuator speed (<5 ms response time), and a more compact profile, the ALD7 was specifically engineered to enable maximized productivity by delivering enhanced control and repeatability of production processes.

The ALD7 valve is offered with:

• Normally closed pneumatic actuations
• Flow coefficient of 0.7 standard; custom flow coefficients available
• Two-port straight and elbow configurations
• Two-, three-, and four-port multiport valves and multivalve manifolds
• Two-and three-port modular surface-mount valves, with C-seal design, in 1.5 in. platforms
• VCR seal fittings, seal fittings, "H" Type VCR, and tube butt weld end connections

Options

• Optional factory-set electronic actuator-position sensor verifies the open position of pneumatically actuated valves
• Optional solenoid pilot valve for electronic control of high-speed actuation

Please reference Ultrahigh-Purity Valves for Atomic Layer Processing, MS-02-301, and ALD7 Diaphragm Valve Technical Report, MS-06-125, for additional technical and ordering information.